MEMS-based spectroscopic ellipsometry

Inhalt:
Beside laser calorimetry or interferometric methods spectroscopic ellipsometry has developed to a standard and accurate method for the determination of layer thicknesses and optical properties of solids. Thereby variations of electromagnetic polarization are measured in reflection. Especially spectroscopic ellipsometry in the near infrared spectral region is important for quality control in the semiconductor and solar industry because complex index of refraction or dielectric function can be obtained in a broad spectral region. So far industrial near infrared ellipsometers are equipped with costly and heavy Fourier transform spectrometers. Modern technologies like micro optical electro mechanical systems (MOEMS) offer in combination with traditional ellipsometric arrangements prospects to realize more cost efficient, flexible and thus miniaturized systems. Due to the spectrometers high scanning speed spectral investigations of kinetic processes by means of spectroscopic ellipsometry is provided within the range of seconds.