Multi-target reactive sputtering technology for functional Pb(Zr,Ti)O3 thin films on 6 inch wafers
Konferenz: MikroSystemTechnik - KONGRESS 2007
15.10.2007 - 17.10.2007 in Dresden, Germany
Tagungsband: MikroSystemTechnik
Seiten: 4Sprache: EnglischTyp: PDF
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Autoren:
Vidyarthi, Vinay Shankar; Suchaneck, Gunnar; Gerlach, Gerald (Technische Universität Dresden, Institut für Festkörperelektronik, Helmholtzstr. 18, 01062 Dre)
Inhalt:
A multi-target reactive sputtering system consisting of Ti, Zr, and Pb metallic targets was used for depositing functional oxides. It has been demonstrated that the sputter system is versatile and can be used for industrial scale deposition of TiO2, ZrO2, and PbTixZr1-xO3 films. Plasma emission monitoring system was exploited to stably control the reactive sputtering process. The in-situ crystallized PbZr40Ti60O3 films on Pt were found to be highly textured with 94 % (111) oriented crystallites. Dielectric loss of the films was ~ 2 %.