In-plane thermal diffusivity measurement of Parylene C thin film with an RTD sensor array on a SiNx membrane
Konferenz: Mikro-Nano-Integration - 9. GMM-Workshop
21.11.2022 - 22.11.2022 in Aachen, Germany
Tagungsband: GMM-Fb. 105: Mikro-Nano-Integration
Seiten: 3Sprache: EnglischTyp: PDF
Autoren:
Jiang, Felix; Schaller, Laura; Ingebrandt, Sven; Vu, Xuan Thang (Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Germany)
Ryu, Meguya (National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan)
Morikawa, Junko (School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, Japan)
Inhalt:
In this work, the capability of a developed device on a chip for measurement of in-plane thin film thermal diffusivity is demonstrated. The device consists of a microstructured resistive heater and several resistive temperature detectors on a thin suspended silicon nitride membrane. The apparent thermal diffusivity of the silicon nitride as well as the Parylene C coated silicon nitride were measured at different distances between sensor and heat source. A distance dependent apparent thermal diffusivity value is observed.