The Effect of Substrate Temperature for Thermal and True Stress on Magnetostrictive Thin Films
Conference: ACTUATOR 2018 - 16th International Conference on New Actuators
06/25/2018 - 06/27/2018 at Bremen, Deutschland
Proceedings: ACTUATOR 2018
Pages: 4Language: englishTyp: PDF
Personal VDE Members are entitled to a 10% discount on this title
Authors:
Yamaguchi, K.; Tsukagoshi, Y.; Yatagai, K.; Onodera, H.; Ishimaru, D.; Uchida, H. T.; Gemma, R.; Matsumura, Y. (Tokai University, Hiratsuka, Japan)
Abstract:
In this study, the internal stress in magnetostrictive thin films was evaluated by the changes in substrate temperature during the deposition. Internal stress of films was strongly dependent on thermal stress. Despite the control of ion bombardment, the values of true stress for the films were not continuous. This suggests that true stress of sputtered magnetostrictive thin films is governed by not only ion bombardment but also microstructural changes with changing in substrate temperature.