MikroSystemTechnik Kongress 2023
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Submicron alignment accuracy of frontside to backside lithography for MEMS applications

Conference: MikroSystemTechnik Kongress 2023 - Kongress
10/23/2023 - 10/25/2023 at Dresden, Deutschland

Proceedings: MikroSystemTechnik Kongress 2023

Pages: 3Language: englishTyp: PDF

Authors:
Langa, Sergiu; Urban, Marco; Herrmann, Andreas; Schumann, Erik; Kleye, Albrecht; Monsalve Guaracao, Jorge Mario; Wagner, Maximilian; Kaiser, Bert (Fraunhofer IPMS, Dresden, Germany)

Abstract:
In this paper we present the results of front-to-back lithography with an alignment accuracy of less than 1 µm. These results were obtained by a combination of 1:1 and 5:1 lithography and an overlay correction by post-processing (rework) the original lithography process. The alignment error was measured using box-in-box structures with an automatic infrared measuring device.