Variability Aware Sub-Wavelength Lithography Characterization for Robust SRAM Design
Konferenz: ARCS 2011 - 24th International Conference on Architecture of Computing Systems
22.02.2011 - 23.02.2011 in Como, Italy
Tagungsband: ARCS 2011
Seiten: 6Sprache: EnglischTyp: PDF
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Autoren:
Dobrovolný, Petr; Miranda, Miguel; Zuber, Paul (Imec, Kapeldreef 75, 3001 Leuven, Belgium)
Inhalt:
This paper presents a tool flow to perform SRAM wide statistical analysis subject to litho and technology process variability. The tool flow is illustrated in few 45 and 32nm industry-grade SRAM vehicles. Selected case studies show how this tool flow successfully captures non-trivial statistical interactions between the SRAM cell and the periphery, otherwise less visible when using statistical electrical simulations of the critical path alone.